Si epitaxial graphite carrier tray
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  • Si epitaxial graphite carrier tray

Si epitaxial graphite carrier tray

Si epitaxial graphite substrates exhibit excellent thermal stability, chemical inertness, and cleanliness, ensuring uniform growth of the epitaxial layer and high wafer yield.

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CVD-SiC Coating

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+86-19138184728

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The Si epitaxial graphite carrier is a core supporting component in semiconductor silicon epitaxy processes. Typically made from high‑purity graphite with a dense CVD SiC coating applied to its surface, it boasts excellent thermal stability, chemical inertness, and cleanliness, ensuring uniform growth of the epitaxial layer and high wafer yield.

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